Atomic layer stack deposition-annealing synthesis of CuWO4

Abstract

A stack deposition-annealing (SDA) approach was demonstrated for the synthesis of CuWO₄via atomic layer deposition (ALD). The resulted CuWO₄ showed promising activity as a photoanode for photoelectrochemical (PEC) water splitting. This methodology can, in principal, be utilized for the ALD of many ternary and quaternary oxides for various applications.