Pore engineering of porous framework materials for efficient SF6 capture

Abstract

Sulfur hexafluoride (SF6) is an artificial inert gas widely used in the power and semiconductor industries and is known to be a significant contributor to the greenhouse effect due to its high global warming potential. Porous framework materials (PFMs), including metal–organic frameworks (MOFs), covalent organic frameworks (COFs) and porous aromatic frameworks (PAFs), are well-established SF6 adsorbents characterized by highly ordered pore structures that can efficiently adsorb SF6via various electrostatic interactions. Recent advancements have focused on optimizing electrostatic interactions with SF6 molecules to enhance their SF6 adsorption performance in industrial settings. However, a comprehensive review on precise control of the structural and chemical properties through pore engineering strategies for PFMs has not been reported yet. This review systematically outlines the structure–activity relationship and the dominant mechanisms of host–guest interaction modes for effective SF6 capture and discusses pore engineering strategies to achieve efficient SF6 capture. Specifically, adjusting the pore structure to align with SF6 molecules, modifying the pore surface to strengthen electrostatic interactions and designing hierarchical pore structures to enhance SF6 adsorption kinetics are involved. Lastly, the potential of PFMs for SF6 capture is discussed from perspectives of AI-driven creation of high-performance PFMs, construction of PFMs with enhanced water- and acid-resistance under specialized conditions and shaping methods, aiming to guide the development of advanced SF6 adsorbents based on PFMs.

Graphical abstract: Pore engineering of porous framework materials for efficient SF6 capture

Article information

Article type
Review Article
Submitted
03 sen 2024
Accepted
16 okt 2024
First published
17 okt 2024

J. Mater. Chem. A, 2025, Advance Article

Pore engineering of porous framework materials for efficient SF6 capture

X. Sun, L. Zhou, J. Chen, Z. Jia, Z. Zhao and Z. Zhao, J. Mater. Chem. A, 2025, Advance Article , DOI: 10.1039/D4TA06241H

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements