Deep X-ray lithography on “sol–gel” processed noble metal mesoarchitectured films

Maxime Gayrard; Benedetta Marmiroli; Francois Chancerel; Philippe Decorse; Heinz Amenitsch; Jennifer Peron; Andrea Cattoni; Marco Faustini

doi:10.1039/D1NR07455E

You do not have JavaScript enabled. Please enable JavaScript to access the full features of the site or access our non-JavaScript page.

Deep X-ray lithography on “sol–gel” processed noble metal mesoarchitectured films†

Maxime Gayrard,^a Benedetta Marmiroli,

^b Francois Chancerel,^acd Philippe Decorse,^e Heinz Amenitsch,^b Jennifer Peron,

^e Andrea Cattoni

^cd and Marco Faustini

*^a

Author affiliations

* Corresponding authors

^a Sorbonne Université, CNRS, Laboratoire Chimie de la Matière Condensée de Paris (LCMCP), F-75005 Paris, France
E-mail: marco.faustini@sorbonne-universite.fr

^b Institute of Inorganic Chemistry, Graz University of Technology, Graz, Austria

^c Institut Photovoltaïque d'Ile-de-France (IPVF), CNRS UMR 9006, Palaiseau, France

^d Centre de Nanosciences et de Nanotechnologies (C2N), CNRS UMR 9001, Université Paris-Saclay, Palaiseau, France

^e Université de Paris, ITODYS, CNRS, UMR 7086, 15 rue J-A de Baïf, F-75013 Paris, France

Abstract

Noble metal coordination xerogel films (mesostructured with block-copolymers) exhibit solubility switching with increasing X-ray irradiation. Different from other sol–gel systems, these are attributed to film deconstruction under irradiation. These materials can be used as recyclable negative tone resists for deep X-ray lithography that can be further converted into metallic nanoarchitectured films.

This article is part of the themed collection: Nanoscale 2022 Emerging Investigators

Download options Please wait...

Supplementary files

Supplementary information PDF (614K)

Article information

DOI: https://doi.org/10.1039/D1NR07455E
Article type: Communication
Submitted: 10 noy 2021
Accepted: 19 dek 2021
First published: 21 dek 2021

Download Citation

Nanoscale, 2022,14, 1706-1712

Permissions

Request permissions

Deep X-ray lithography on “sol–gel” processed noble metal mesoarchitectured films

M. Gayrard, B. Marmiroli, F. Chancerel, P. Decorse, H. Amenitsch, J. Peron, A. Cattoni and M. Faustini, Nanoscale, 2022, 14, 1706 DOI: 10.1039/D1NR07455E

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Social activity

Fetching data from CrossRef.
This may take some time to load.

Nanoscale

Deep X-ray lithography on “sol–gel” processed noble metal mesoarchitectured films†

Abstract

Supplementary files

Article information

Download Citation

Permissions

Deep X-ray lithography on “sol–gel” processed noble metal mesoarchitectured films

Social activity

Search articles by author

Spotlight

Advertisements