What could be the low-temperature limit of atomic layer deposition of platinum using MeCpPtMe3 and oxygen?

Hao Van Bui; Anh Phan Nguyen; Manh Duc Dang; Truong Duc Dinh; Patricia J. Kooyman; J. Ruud Van Ommen

doi:10.1039/D4CC04679J

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What could be the low-temperature limit of atomic layer deposition of platinum using MeCpPtMe₃ and oxygen?†

Hao Van Bui,

*^a Anh Phan Nguyen,^a Manh Duc Dang,^a Truong Duc Dinh,^a Patricia J. Kooyman

^b and J. Ruud Van Ommen

Author affiliations

* Corresponding authors

^a Faculty of Materials Science and Engineering, Phenikaa University, Yen Nghia, Ha Dong District, Hanoi 12116, Vietnam
E-mail: hao.buivan@phenikaa-uni.edu.vn

^b Catalysis Institute, Department of Chemical Engineering, University of Cape Town, South Africa

^c Department of Chemical Engineering, Delft University of Technology, Van der Maasweg 9, Delft, The Netherlands

Abstract

We explore the low-temperature limit of atomic layer deposition of Pt using MeCpPtMe₃ and O₂. We reveal that by supplying a sufficiently high O₂ exposure, highly dispersed and thermally stable Pt sub-nanometer clusters can be deposited onto the surface of P25 TiO₂ nanoparticles even at room temperature by atmospheric-pressure ALD.

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Article information

DOI: https://doi.org/10.1039/D4CC04679J
Article type: Communication
Submitted: 11 sen 2024
Accepted: 01 noy 2024
First published: 01 noy 2024

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Chem. Commun., 2024,60, 14045-14048

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What could be the low-temperature limit of atomic layer deposition of platinum using MeCpPtMe₃ and oxygen?

H. Van Bui, A. P. Nguyen, M. D. Dang, T. D. Dinh, P. J. Kooyman and J. Ruud Van Ommen, Chem. Commun., 2024, 60, 14045 DOI: 10.1039/D4CC04679J

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