Issue 65, 2015
From the journal:

RSC Advances

Correction: Using a functional C84 monolayer to improve the mechanical properties and alter substrate deformation

Wen-Jay Lee,*ac   Mon-Shu Ho,cd   Chih-Pong Huang,e   Che-Fu Chou,c   Jyun-Hwei Tsaib  and  Wan-Sheng Su*bc  

* Corresponding authors

a National Center for High-Performance Computing, Taichung 40763, Taiwan
E-mail: wjlee@nchc.narl.org.tw

b National Center for High-Performance Computing, Hsinchu 30076, Taiwan
E-mail: wssu@nchc.narl.org.tw

c Department of Physics, National Chung Hsing University, Taichung 40227, Taiwan

d Institute of Nanoscience, National Chung Hsing University, Taichung 40227, Taiwan

e Materials & Electro-Optics Research Division, Chung-Shan Institute of Science and Technology, Taoyuan 325, Taiwan

Abstract

Correction for ‘Using a functional C84 monolayer to improve the mechanical properties and alter substrate deformation’ by Wen-Jay Lee et al., RSC Adv., 2015, 5, 47498–47505.

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Article information

DOI
https://doi.org/10.1039/C5RA90056E
Article type
Correction
Submitted
03 Jun 2015
Accepted
03 Jun 2015
First published
12 Jun 2015
This article is Open Access
Creative Commons BY license

RSC Adv., 2015,5, 52320-52320

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Correction: Using a functional C84 monolayer to improve the mechanical properties and alter substrate deformation

W. Lee, M. Ho, C. Huang, C. Chou, J. Tsai and W. Su, RSC Adv., 2015, 5, 52320 DOI: 10.1039/C5RA90056E

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