A vertical WSe2–MoSe2 p–n heterostructure with tunable gate rectification†
Abstract
Here, we report the synthesis of a vertical MoSe2/WSe2 p–n heterostructure using a sputtering-CVD method. Unlike the conventional CVD method, this method produced a continuous MoSe2/WSe2 p–n heterostructure. WSe2 and MoSe2 back-gated field effect transistors (FETs) exhibited good gate modulation behavior, and high hole and electron mobilities of ∼2.2 and ∼15.1 cm2 V−1 s−1, respectively. The fabricated vertical MoSe2/WSe2 p–n diode showed rectifying I–V behavior with back-gate tunability. The rectification ratio of the diode was increased with increasing gate voltage, and was increased from ∼18 to ∼1600 as the gate bias increased from −40 V to +40 V. This is attributed to the fact that the barrier height between p-WSe2 and n-MoSe2 is modulated due to the back-gate bias. The rectification ratio is higher than the previously reported values for the TMDC p–n heterostructure grown by CVD.
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