Issue 11, 2020
From the journal:

Nanoscale Advances

Correction: Facile, wafer-scale compatible growth of ZnO nanowires via chemical bath deposition: assessment of zinc ion contribution and other limiting factors

Yu-Chen Huang,a   Junze Zhou,a   Komla Nomenyo,a   Rodica Elena Ionescu,a   Anisha Gokarna*a  and  Gilles Lerondel*a  

* Corresponding authors

a Laboratory of Light, Nanomaterials and Nanotechnologies (L2n), CNRS ERL 7004, University of Technology of Troyes, 12 rue Marie Curie, BP 2060, 10004 Troyes, France
E-mail: anisha.gokarna@utt.fr, gilles.lerondel@utt.fr

Abstract

Correction for ‘Facile, wafer-scale compatible growth of ZnO nanowires via chemical bath deposition: assessment of zinc ion contribution and other limiting factors’ by Yu-Chen Huang et al., Nanoscale Adv., 2020, DOI: 10.1039/d0na00434k.

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Article information

DOI
https://doi.org/10.1039/D0NA90053B
Article type
Correction
Submitted
16 Oct 2020
Accepted
16 Oct 2020
First published
23 Oct 2020
This article is Open Access
Creative Commons BY license

Nanoscale Adv., 2020,2, 5478-5478

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Correction: Facile, wafer-scale compatible growth of ZnO nanowires via chemical bath deposition: assessment of zinc ion contribution and other limiting factors

Y. Huang, J. Zhou, K. Nomenyo, R. E. Ionescu, A. Gokarna and G. Lerondel, Nanoscale Adv., 2020, 2, 5478 DOI: 10.1039/D0NA90053B

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