Issue 24, 2024

Arylselanyl motifs in hierarchically structured mesoporous phenolic polymers: efficient adsorption sites for Hg2+ ions

Abstract

Strategic installation of heteroatoms and modulation of porous hierarchy of polymers are significant approaches to obtain high-performance materials for practical applications. This study focuses on the syntheses of selenium-containing porous phenolic resin (Se-PR) using cheap raw materials, phenol and selenium dioxide. Two morphologically distinct polymers, Se-PR 1 and Se-PR 2, were obtained via one-step synthesis using DMF and DMSO, respectively, as solvents. Various material characterization techniques such as thermogravimetry, powder X-ray diffraction, BET analysis, X-ray photoelectron spectroscopy, FT-IR spectroscopy and FE-SEM were used to establish the structure and morphology of the polymers. These studies confirmed that the morphology of the polymers is significantly altered by the solvents. Their in-built porous structure with appropriately placed selenium centers in the form of arylselanyl motifs, allows the polymers to display high binding affinity and fast adsorption kinetics towards Hg2+ ions. The maximum Hg2+ ion uptake capacities for Se-PR 1 and 2 were 625 mg L−1 and 1057 mg L−1, respectively, which highlight the potential of organoselenium polymers as efficient adsorbents for Hg2+ removal from water via soft–soft Lewis acid–base interaction (Hg2+⋯Se) and underscore their promising role in environmental remediation.

Graphical abstract: Arylselanyl motifs in hierarchically structured mesoporous phenolic polymers: efficient adsorption sites for Hg2+ ions

Associated articles

Supplementary files

Article information

Article type
Paper
Submitted
05 Sep 2024
Accepted
12 Nov 2024
First published
13 Nov 2024
This article is Open Access
Creative Commons BY license

Mater. Adv., 2024,5, 9838-9850

Arylselanyl motifs in hierarchically structured mesoporous phenolic polymers: efficient adsorption sites for Hg2+ ions

V. Selladurai and S. Karuthapandi, Mater. Adv., 2024, 5, 9838 DOI: 10.1039/D4MA00899E

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