Mechanism of photoformation of 1-cyanobenzosemibullvalene
Abstract
Deuterium labelling reveals that 1-cyanobenzosemibullvalene derived from the sensitized irradiation of 2-cyanobenzobarrelene is formed by a di-π-methane rearrangement initiated by vinyl–vinylcano-bridging and not by the benzo–vinylcyano-mechanism proposed by Houk.