Issue 22, 2000
From the journal:

Chemical Communications

In situSTM observation with atomic resolution on platinum film electrodes formed by a sputtering method

Shueh-Lin Yau,a   Takahiro Moriyama,b   Hiroyuki Uchidab  and  Masahiro Watanabe*b  

* Corresponding authors

a Department of Chemistry, National Central University, Chungli, Taiwan, ROC.
E-mail: sly@rs250.ncu.edu.tw

b Laboratory of Electrochemical Energy Conversion, Faculty of Engineering, Yamanashi University, Takeda 4-3, Kofu, 400-8511, Japan.
E-mail: mwatanab@ab11.yamanashi.ac.jp

Abstract

The first high-quality in situ STM atomic images of sputtering-deposited platinum film electrodes potentiostated at 0.15 V (vs. RHE) in 0.1 M HClO4 are reported showing that potential-induced hydrogen adsorption effectively cleaned the Pt surfaces with predominantly (111)-oriented facets.

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Article information

DOI
https://doi.org/10.1039/B007222M
Article type
Communication
Submitted
06 Sep 2000
Accepted
10 Oct 2000
First published
03 Nov 2000

Chem. Commun., 2000, 2279-2280

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In situ STM observation with atomic resolution on platinum film electrodes formed by a sputtering method

S. Yau, T. Moriyama, H. Uchida and M. Watanabe, Chem. Commun., 2000, 2279 DOI: 10.1039/B007222M

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