14N@C60 formation in a nitrogen rf-plasma
Abstract
Atomic
* Corresponding authors
a
Materials Laboratories, Sony Corporation, 2-1-1 Shinsakuragaoka Hodogaya, Yokohama, Japan
E-mail:
Houjin.huang@jp.sony.com
Fax: 81 45 353 6904
Tel: 81 45 353 6863
Atomic
H. Huang, M. Ata and M. Ramm, Chem. Commun., 2002, 2076 DOI: 10.1039/B206247J
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