Significant promotional effect of CCl4 on fullerene yield in the graphite arc-discharge reaction†
Abstract
Addition of a small quantity (∼3%) of
* Corresponding authors
a
State Key Laboratory for Physical Chemistry of Solid Surfaces, Department of Chemistry, Xiamen University, Xiamen, 361005, P. R. China
E-mail:
syxie@jingxian.xmu.edu.cn
Addition of a small quantity (∼3%) of
F. Gao, S. Xie, R. Huang and L. Zheng, Chem. Commun., 2003, 2676 DOI: 10.1039/B306921B
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