Issue 45, 2006
From the journal:

Dalton Transactions

Design of precursors for the CVD of inorganic thin films†

Lisa McElwee-White*a  

* Corresponding authors

a Department of Chemistry, University of Florida, Gainesville, FL, USA
E-mail: lmwhite@chem.ufl.edu
Fax: +1 (352) 846-0296

Abstract

Applications of inorganic thin films in the electronics industry have spurred activity in the area of chemical vapor deposition (CVD). This article discusses the increasingly sophisticated design strategies for precursor complexes through a series of case studies on CVD of metal oxide and metal nitride films.

Graphical abstract: Design of precursors for the CVD of inorganic thin films

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Article information

DOI
https://doi.org/10.1039/B611848H
Article type
Frontier
Submitted
16 Aug 2006
Accepted
10 Oct 2006
First published
17 Oct 2006

Dalton Trans., 2006, 5327-5333

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Design of precursors for the CVD of inorganic thin films

L. McElwee-White, Dalton Trans., 2006, 5327 DOI: 10.1039/B611848H

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