Near-IR sensitization of wide band gap oxide semiconductor by axially anchored Si-naphthalocyanines
Abstract
Near-IR
* Corresponding authors
a
Departamento de Química, Universidad Nacional de Río Cuarto, Agencia Postal 3, Río Cuarto, Argentina
E-mail:
lotero@exa.unrc.edu.ar
b
Photovoltaic and Optoelectronic Devices Group, Departament de Fisica, Universitat Jaume I, Castelló, Spain
E-mail:
bisquert@fca.uji.es
Near-IR
L. Macor, F. Fungo, T. Tempesti, E. N. Durantini, L. Otero, E. M. Barea, F. Fabregat-Santiago and J. Bisquert, Energy Environ. Sci., 2009, 2, 529 DOI: 10.1039/B822954F
To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.
If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.
If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.
Read more about how to correctly acknowledge RSC content.
Fetching data from CrossRef.
This may take some time to load.
Loading related content