Enhanced catalyticreduction of oxygen at tantalum deposited platinumelectrode†
Abstract
A tantalum deposited
* Corresponding authors
a
Department of Electronic Chemistry, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259-G1-5 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan
E-mail:
ohsaka@echem.titech.ac.jp
Fax: +81-45-924-5489
Tel: +81-45-924-5404
b Beijing National Laboratory for Molecular Sciences, Institute of Chemistry, Chinese Academy of Science, Beijing 100080, China
A tantalum deposited
B. N. Ferdousi, Md. Mominul Islam, T. Okajima, L. Mao and T. Ohsaka, Chem. Commun., 2010, 46, 1165 DOI: 10.1039/B916826E
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