Issue 14, 2010
From the journal:

Lab on a Chip

Patterning microfluidic device wettability using flow confinement†

Adam R. Abate,‡a   Julian Thiele,‡ab   Marie Weinhartc  and  David A. Weitz*a  

* Corresponding authors

a School of Engineering and Applied Sciences/Department of Physics, Harvard University, Cambridge, Massachusetts, USA
E-mail: weitz@seas.harvard.edu
Tel: +1 617-495-3275

b Institute of Physical Chemistry, University of Hamburg, Germany

c Institute of Chemistry and Biochemistry—Organic Chemistry, Freie Universitaet Berlin, Germany

Abstract

We present a simple method to spatially pattern the surface properties of microfluidic devices using flow confinement. Our technique allows surface patterning with micron-scale resolution. To demonstrate its effectiveness, we use it to pattern wettability to form W/O/W and O/W/O double emulsions.

Graphical abstract: Patterning microfluidic device wettability using flow confinement

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Article information

DOI
https://doi.org/10.1039/C004124F
Article type
Communication
Submitted
10 Mar 2010
Accepted
05 May 2010
First published
21 May 2010

Lab Chip, 2010,10, 1774-1776

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Patterning microfluidic device wettability using flow confinement

A. R. Abate, J. Thiele, M. Weinhart and D. A. Weitz, Lab Chip, 2010, 10, 1774 DOI: 10.1039/C004124F

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