Programming nanostructures of polymer brushes by dip-pen nanodisplacement lithography (DNL)†
Abstract
We report a facile and versatile scanning
* Corresponding authors
a
Nanotechnology Center, Institute of Textiles and Clothing, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong SAR, China
E-mail:
tczzheng@inet.polyu.edu.hk
Fax: +852-27731432
Tel: +852-27666441
We report a facile and versatile scanning
X. Liu, Y. Li and Z. Zheng, Nanoscale, 2010, 2, 2614 DOI: 10.1039/C0NR00565G
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