Issue 8, 2011
From the journal:

Chemical Communications

Anisotropic oxygen plasma etching of colloidal particles in electrospun fibers†

Tao Ding,ab   Ye Tian,bc   Kui Liang,a   Koen Clays,*d   Kai Song,*a   Guoqiang Yanga  and  Chen-Ho Tungae  

* Corresponding authors

a Beijing National Laboratory for Molecular Sciences, Key Laboratory of Photochemistry, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China
E-mail: kai.song@iccas.ac.cn

b Graduate University of the Chinese Academy of Sciences, Beijing 100049, China

c Beijing National Laboratory for Molecular Sciences, State Key Laboratory of Polymer Physics and Chemistry, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China

d Department of Chemistry, University of Leuven, Celestijnenlaan 200D, Leuven, Belgium
E-mail: koen.clays@fys.kuleuven.be

e Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China

Abstract

Oxygen plasma etching of electrospun polymer fibers containing spherical colloids is presented as a new approach towards anisotropic colloidal nanoparticles. The detailed morphology of the resulting nanoparticles can be precisely controlled in a continuous way. The same approach is also amenable to prepare inorganic nanoparticles with double-sided patches.

Graphical abstract: Anisotropic oxygen plasma etching of colloidal particles in electrospun fibers

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Article information

DOI
https://doi.org/10.1039/C0CC04393A
Article type
Communication
Submitted
13 Oct 2010
Accepted
26 Nov 2010
First published
20 Dec 2010

Chem. Commun., 2011,47, 2429-2431

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Anisotropic oxygen plasma etching of colloidal particles in electrospun fibers

T. Ding, Y. Tian, K. Liang, K. Clays, K. Song, G. Yang and C. Tung, Chem. Commun., 2011, 47, 2429 DOI: 10.1039/C0CC04393A

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