Issue 18, 2011
From the journal:

Chemical Communications

Contact area lithography and pattern transfer of self-assembled organic monolayers on SiO2/Si substrates

Changdeuck Bae,a   Hyunchul Kimb  and  Hyunjung Shin*b  

* Corresponding authors

a Institute of Applied Physics, University of Hamburg, Jungiusstr. 11, 20355 Hamburg, Germany

b School of Advanced Materials Engineering, Kookmin University, Jeongneung-Gil 77, Seoul 136-702, South Korea
E-mail: hjshin@kookmin.ac.kr
Fax: +82 2 910 4320
Tel: +82 2 910 4897

Abstract

We describe a procedure for one-step patterning and transfer of self-assembled organic monolayers (SAMs) on SiO2/Si substrates. This procedure was inspired from an idea of pattern formation at contact area, which realizes high patterning fidelity, and enables a universal approach for the micro/nanometre scale patterning of SAMs.

Graphical abstract: Contact area lithography and pattern transfer of self-assembled organic monolayers on SiO2/Si substrates

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Article information

DOI
https://doi.org/10.1039/C1CC10283D
Article type
Communication
Submitted
15 Jan 2011
Accepted
07 Mar 2011
First published
21 Mar 2011

Chem. Commun., 2011,47, 5145-5147

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Contact area lithography and pattern transfer of self-assembled organic monolayers on SiO2/Si substrates

C. Bae, H. Kim and H. Shin, Chem. Commun., 2011, 47, 5145 DOI: 10.1039/C1CC10283D

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