Superhydrophobic nanostructured silicon surfaces with controllable broadband reflectance

Abstract

Nanostructured superhydrophobic silicon surfaces with tunable reflectance are fabricated via a simple maskless deep reactive-ion etching process. By controlling the scale of the high-aspect-ratio nanostructures on a wafer-scale surface, surface reflectance is maximized or minimized over the UV–vis–IR range while maintaining superhydrophobic properties.