A general route for RuO2 deposition on metal oxides from RuO4

Alan Kleiman-Shwarsctein; Anders B. Laursen; Filippo Cavalca; Wei Tang; Søren Dahl; Ib Chorkendorff

doi:10.1039/C1CC16759F

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A general route for RuO₂ deposition on metal oxides from RuO₄†

Alan Kleiman-Shwarsctein,^a Anders B. Laursen,^a Filippo Cavalca,^b Wei Tang,^a Søren Dahl^a and Ib Chorkendorff*^a

Author affiliations

* Corresponding authors

^a Center for Individual Nanoparticle Functionality, Department of Physics, Building 312, Fysikvej, Technical University of Denmark, DTU, DK-2800 Kgs. Lyngby, Denmark
E-mail: ibchork@fysik.dtu.dk

^b Center for Electron Nanoscopy, Building 307, Fysikvej, Technical University of Denmark, DTU, DK-2800 Kgs. Lyngby, Denmark

Abstract

A novel method for the deposition of RuO₂ from RuO₄(g) on diverse metal oxides has been developed by grafting dopamine onto the otherwise un-reactive metal oxide surface. Oxygen evolution reaction on TiO₂ and the photoelectrochemical improvement of WO₃ by deposition of RuO₂ are just a few examples where this novel deposition method can be used.

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Article information

DOI: https://doi.org/10.1039/C1CC16759F
Article type: Communication
Submitted: 01 Nov 2011
Accepted: 16 Nov 2011
First published: 16 Nov 2011

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Chem. Commun., 2012,48, 967-969

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A general route for RuO₂ deposition on metal oxides from RuO₄

A. Kleiman-Shwarsctein, A. B. Laursen, F. Cavalca, W. Tang, S. Dahl and I. Chorkendorff, Chem. Commun., 2012, 48, 967 DOI: 10.1039/C1CC16759F

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Chemical Communications