Top-down patterning of Zeolitic Imidazolate Framework composite thin films by deep X-ray lithography†
Abstract
For the first time a top-down process was used to control the spatial location of Metal–Organic Frameworks on a surface. Deep
* Corresponding authors
a
Division of Materials Science and Engineering, CSIRO, Private Bag 33, Clayton South MDC 3169, Australia
E-mail:
Matthew.Hill@csiro.au, Paolo.Falcaro@csiro.au
Tel: +61 3 9545 2841
b Department of Chemical Engineering, Monash University, Wellington Road, Clayton 3800, Australia
c Institute of Biophysics and Nanosystems Research, Austrian Academy of Sciences, Schmiedlstrasse 6, 8042 Graz, Austria
d Laboratorio di Scienza dei Materiali e Nanotecnologie (LMNT), CR-INSTM, Universtà di Sassari, Palazzo Pou Salid, Alghero, SS, Italy
e CMR-IOM, Laboratorio TASC, S.S. 14 km 163.5 Area Science Park, Basovizza, Trieste, Italy
f Sincrotrone Trieste S.C.p.A. S.S. 14, Km 163.5 Area Science Park, Basovizza, Trieste, Italy
g Leibniz Institute of Polymer Research Dresden, Hohe Strasse 6, 01069 Dresden, Germany
For the first time a top-down process was used to control the spatial location of Metal–Organic Frameworks on a surface. Deep
C. Dimitrakakis, B. Marmiroli, H. Amenitsch, L. Malfatti, P. Innocenzi, G. Grenci, L. Vaccari, A. J. Hill, B. P. Ladewig, M. R. Hill and P. Falcaro, Chem. Commun., 2012, 48, 7483 DOI: 10.1039/C2CC33292B
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