Issue 7, 2013

Selective surface functionalization at regions of high local curvature in graphene

Abstract

Monolayer graphene was deposited on a Si wafer substrate decorated with SiO2 nanoparticles (NPs) and then exposed to aryl radicals that were generated in situ from their diazonium precursors. Using micro-Raman mapping, the aryl radicals were found to selectively react with the regions of graphene that covered the NPs. The enhanced chemical reactivity was attributed to the increased strain energy induced by the local mechanical deformation of the graphene.

Graphical abstract: Selective surface functionalization at regions of high local curvature in graphene

Supplementary files

Article information

Article type
Communication
Submitted
17 Sep 2012
Accepted
26 Nov 2012
First published
29 Nov 2012

Chem. Commun., 2013,49, 677-679

Selective surface functionalization at regions of high local curvature in graphene

Q. Wu, Y. Wu, Y. Hao, J. Geng, M. Charlton, S. Chen, Y. Ren, H. Ji, H. Li, D. W. Boukhvalov, R. D. Piner, C. W. Bielawski and R. S. Ruoff, Chem. Commun., 2013, 49, 677 DOI: 10.1039/C2CC36747E

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