Issue 42, 2013
From the journal:

CrystEngComm

High-throughput fabrication of large-scale highly ordered ZnO nanorod arrays via three-beam interference lithography†

Xiang Chen,‡a   Xiaoqin Yan,‡a   Zhiming Bai,a   Yanwei Shen,a   Zengze Wang,a   Xianzi Dong,c   Xuanming Duanc  and  Yue Zhang*ab  

* Corresponding authors

a State Key Laboratory for Advanced Metals and Materials, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China
E-mail: yuezhang@ustb.edu.cn
Tel: +86 10 62334725

b Key Laboratory of New Energy Materials and Technologies, University of Science and Technology Beijing, Beijing 100083, China
E-mail: yuezhang@ustb.edu.cn
Tel: +86 10 62334725

c Laboratory of Organic NanoPhotonics, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100080, China
E-mail: xmduan@mail.ipc.ac.cn
Tel: +86 10 82543596

Abstract

Large-scale highly ordered ZnO nanorod arrays with precise period control and uniform distribution are easily fabricated via three-beam interference lithography, top anti-reflective coating and hydrothermal synthesis. This new method demonstrates an efficient way to fabricate large-scale highly ordered semiconductor nanorod arrays and could meet the needs of nanomaterial design, nanodevice optimization and nanosystem integration.

Graphical abstract: High-throughput fabrication of large-scale highly ordered ZnO nanorod arrays via three-beam interference lithography

About
Cited by
Related
Download options Please wait...

Supplementary files

Article information

DOI
https://doi.org/10.1039/C3CE41558A
Article type
Communication
Submitted
04 Aug 2013
Accepted
23 Aug 2013
First published
23 Aug 2013

CrystEngComm, 2013,15, 8416-8421

Permissions

Request permissions

High-throughput fabrication of large-scale highly ordered ZnO nanorod arrays via three-beam interference lithography

X. Chen, X. Yan, Z. Bai, Y. Shen, Z. Wang, X. Dong, X. Duan and Y. Zhang, CrystEngComm, 2013, 15, 8416 DOI: 10.1039/C3CE41558A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements