An approach to form organic thin films that employs multicomponent solids in the form of co-crystals has been developed. The components direct an intermolecular [2+2] photodimerization that we demonstrate exhibits a change in solubility that can be exploited as a negative photoresist for use in photolithography.
![Graphical abstract: From co-crystals to functional thin films: photolithography using [2+2] photodimerization](/en/Image/Get?imageInfo.ImageType=GA&imageInfo.ImageIdentifier.ManuscriptID=C3SC51073E&imageInfo.ImageIdentifier.Year=2013)
S. Ghorai, J. C. Sumrak, K. M. Hutchins, D. Bučar, A. V. Tivanski and L. R. MacGillivray, Chem. Sci., 2013, 4, 4304 DOI: 10.1039/C3SC51073E
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