Freestanding silicon films formed on ionic liquid surfaces†
Abstract
Freestanding silicon films with a thickness ranging from 1 nm to several micrometers were prepared by
* Corresponding authors
a
State Key Laboratory of Catalysis, Dalian Institute of Chemical Physics, Chinese Academy of Sciences and Dalian National Laboratory for Clean Energy, Dalian 116023, China
E-mail:
canli@dicp.ac.cn
Web: http://www.canli.dicp.ac.cn
Fax: +86 411 84694447
Tel: +86 411 84379070
b Graduate University of Chinese Academy of Sciences, Beijing 100049, China
Freestanding silicon films with a thickness ranging from 1 nm to several micrometers were prepared by
S. Cheng, L. Hu, W. Qin, F. Xiong and C. Li, J. Mater. Chem. A, 2013, 1, 55 DOI: 10.1039/C2TA00503D
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