Issue 1, 2013

Freestanding silicon films formed on ionic liquid surfaces

Abstract

Freestanding silicon films with a thickness ranging from 1 nm to several micrometers were prepared by Cat-CVD onto ionic liquid ([BMIM][BF4]) surfaces for the first time. The films, obtained without a solid substrate, can be facilely characterized by TEM and AFM to study the film formation and growth process.

Graphical abstract: Freestanding silicon films formed on ionic liquid surfaces

Supplementary files

Article information

Article type
Communication
Submitted
30 Sep 2012
Accepted
01 Nov 2012
First published
02 Nov 2012

J. Mater. Chem. A, 2013,1, 55-58

Freestanding silicon films formed on ionic liquid surfaces

S. Cheng, L. Hu, W. Qin, F. Xiong and C. Li, J. Mater. Chem. A, 2013, 1, 55 DOI: 10.1039/C2TA00503D

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