Issue 19, 2013

Controlled synthesis of patterned W18O49nanowire vertical-arrays and improved field emission performance by in situ plasma treatment

Abstract

W18O49 nanowires have been intensively studied in recent years due to their good field emission (FE) performances. However, now their development has encountered difficulties, i.e., their emission uniformity is not good enough for high resolution field emission display (FED) applications. Here, we have successfully fabricated patterned, large-scale W18O49 nanowire vertical-arrays and for the first time applied an in situ plasma treatment technique to improve their field emission performance. It is found that their emission uniformity has been improved to a very high level (distribution uniformity of emission sites is higher than 96% and their brightness uniformity reaches 75.64%), while other emission properties remained unchanged compared to untreated nanowires. The bombardment of Ar plasma and the reduction of H2 plasma may be responsible for the improvement of their FE performance. It can be concluded that this developed technique is a very effective route to enhance the emission uniformity of patterned W18O49 nanowire arrays, which may pave the way for FE emission behavior improvement of other metal oxide nanowires.

Graphical abstract: Controlled synthesis of patterned W18O49 nanowire vertical-arrays and improved field emission performance by in situ plasma treatment

Article information

Article type
Paper
Submitted
22 Feb 2013
Accepted
21 Mar 2013
First published
21 Mar 2013

J. Mater. Chem. C, 2013,1, 3217-3225

Controlled synthesis of patterned W18O49 nanowire vertical-arrays and improved field emission performance by in situ plasma treatment

F. Liu, T. Guo, Z. Xu, H. Gan, L. Li, J. Chen, S. Deng, N. Xu, D. Golberg and Y. Bando, J. Mater. Chem. C, 2013, 1, 3217 DOI: 10.1039/C3TC30340C

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements