Issue 33, 2014

Examination of surface phenomena of V2O5 loaded on new nanostructured TiO2 prepared by chemical vapor condensation for enhanced NH3-based selective catalytic reduction (SCR) at low temperatures

Abstract

In this article, we describe the investigation and surface characterization of a chemical vapor condensation (CVC)-TiO2 support material used in a V2O5/TiO2 catalyst for enhanced selective catalytic reduction (SCR) activity and confirm the mechanism of surface reactions. On the basis of previous studies and comparison with a commercial TiO2 catalyst, we examine four fundamental questions: first, the reason for increased surface V4+ ion concentrations; second, the origin of the increase in surface acid sites; third, a basis for synergistic influences on improvements in SCR activity; and fourth, a reason for improved catalytic activity at low reaction temperatures. In this study, we have cited the result of SCR with NH3 activity for removing NOx and analyzed data using the reported result and data from previous studies on V2O5/CVC-TiO2 for the SCR catalyst. In order to determine the properties of suitable CVC-TiO2 surfaces for efficient SCR catalysis at low temperatures, CVC-TiO2 specimens were prepared and characterized using techniques such as XRD, BET, HR-TEM, XPS, FT-IR, NH3-TPD, photoluminescence (PL) spectroscopy, H2-TPR, and cyclic voltammetry. The results obtained for the CVC-TiO2 materials were also compared with those of commercial TiO2.

Graphical abstract: Examination of surface phenomena of V2O5 loaded on new nanostructured TiO2 prepared by chemical vapor condensation for enhanced NH3-based selective catalytic reduction (SCR) at low temperatures

Article information

Article type
Paper
Submitted
09 May 2014
Accepted
15 Jul 2014
First published
15 Jul 2014

Phys. Chem. Chem. Phys., 2014,16, 17900-17907

Examination of surface phenomena of V2O5 loaded on new nanostructured TiO2 prepared by chemical vapor condensation for enhanced NH3-based selective catalytic reduction (SCR) at low temperatures

W. Cha, S. Yun and J. Jurng, Phys. Chem. Chem. Phys., 2014, 16, 17900 DOI: 10.1039/C4CP02025A

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