The use of the fluorinated alcohol, 1,1,1,3,3,3-hexafluoro-2-propanol (HFIP) as a processing solvent for orthogonal alignment of a DNA–surfactant complex is reported herein. 1-butanol (BuOH) was used as the control. At low frequencies, films of DNA–CTMA cast from HFIP exhibited a higher, more consistent dielectric constant and a lower dissipation factor compared to films cast from BuOH.
D. M. D. Mamangun, J. L. Santana, F. Ouchen, J. G. Grote and G. A. Sotzing, RSC Adv., 2014, 4, 39798 DOI: 10.1039/C4RA04766D
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