Issue 17, 2015
From the journal:

Chemical Communications

Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene†

Amit K. Roy,a   Jolien Dendooven,a   Davy Deduytsche,a   Kilian Devloo-Casier,a   Kim Ragaert,b   Ludwig Cardonb  and  Christophe Detavernier*a  

* Corresponding authors

a Department of Solid State Sciences, Faculty of Sciences, Ghent University, Krijgslaan 281/S1, B-9000 Gent, Belgium
E-mail: Christophe.Detavernier@UGent.be

b Centre for Polymer and Material Technologies, Faculty of Engineering and Architecture, Ghent University, Technologiepark 915, B-9052 Zwijnaarde, Belgium

Abstract

This communication reports an approach based on plasma-enhanced atomic layer deposition of aluminium oxide for the functionalization of polytetrafluoroethylene (PTFE or “Teflon”) surfaces. Alternating exposure of PTFE to oxygen plasma and trimethylaluminium causes a permanent hydrophilic effect, and a more than 10-fold improvement of the “glueability” of PTFE to aluminium.

Graphical abstract: Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene

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Article information

DOI
https://doi.org/10.1039/C4CC09474C
Article type
Communication
Submitted
26 Nov 2014
Accepted
22 Jan 2015
First published
23 Jan 2015

Chem. Commun., 2015,51, 3556-3558

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Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene

A. K. Roy, J. Dendooven, D. Deduytsche, K. Devloo-Casier, K. Ragaert, L. Cardon and C. Detavernier, Chem. Commun., 2015, 51, 3556 DOI: 10.1039/C4CC09474C

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