Issue 118, 2015

Controllable boron doping of carbon nanotubes with tunable dopant functionalities: an effective strategy toward carbon materials with enhanced electrical properties

Abstract

We present a two-step postgrowth substitution reaction route to produce boron-doped carbon nanotubes (BCNTs) with controllable B dopant concentration and uniform B atom distribution under atmospheric pressure. The unique two-step postgrowth substitution reaction route comprised a simple wet-chemistry-assisted pretreatment and an atmospheric-pressure carbothermic reaction. Extensive materials characterizations confirmed that BCNTs with uniform B dopant distribution and controllable B atomic concentration from 0.40 to 3.92 atomic percent (atom%) can be produced by controlling the reaction time and temperature under atmospheric pressure in the developed method. The film-based electrical sheet resistance measurement indicates that the averaged electrical sheet resistances of the as-fabricated CNT-based films can be improved from 1520 ± 197.56 to 43.67 ± 12.63 Ω per square with 2.09 atom% B concentration in the doped CNTs. High-resolution X-ray photoelectron spectroscopy (HRXPS) characterization suggests that the B–C–O bonding types and concentrations in the as-produced BCNTs may play an important role in the nanotube electrical properties. Our study provides a methodology to tailor the material properties of carbon-based materials.

Graphical abstract: Controllable boron doping of carbon nanotubes with tunable dopant functionalities: an effective strategy toward carbon materials with enhanced electrical properties

Supplementary files

Article information

Article type
Paper
Submitted
06 Oct 2015
Accepted
29 Oct 2015
First published
30 Oct 2015

RSC Adv., 2015,5, 97579-97588

Author version available

Controllable boron doping of carbon nanotubes with tunable dopant functionalities: an effective strategy toward carbon materials with enhanced electrical properties

W. Chiang, G. Chen, C. Hsieh and S. Lo, RSC Adv., 2015, 5, 97579 DOI: 10.1039/C5RA20664B

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