Passivation of surface states by ALD-grown TiO2 overlayers on Ta3N5 anodes for photoelectrochemical water oxidation

Abstract

This paper describes the fabrication of TiO₂ overlayers by atomic layer deposition to passivate the surface states on Ta₃N₅ thin film anodes for photoelectrochemical water oxidation. The removal of surface states reduces the overpotential and decreases the density of surface recombination centers, resulting in enhanced activity through effective utilization of photogenerated charge carriers.