A vortex fluid device (VFD) with non-thermal plasma liquid processing within dynamic thin films has been developed. This plasma–liquid microfluidic platform facilitates chemical processing which is demonstrated through the manipulation of the morphology and chemical character of colloidal graphene oxide in water.
D. B. Jones, X. Chen, A. Sibley, J. S. Quinton, C. J. Shearer, C. T. Gibson and C. L. Raston, Chem. Commun., 2016, 52, 10755 DOI: 10.1039/C6CC04032B
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