Issue 35, 2016

Growth kinetics of copper sulfide thin films by photochemical deposition

Abstract

In this work, copper sulfide (CuxS) thin films were deposited by photochemical deposition (PCD). Although deposition of CuxS thin films via PCD undergoes both heterogeneous and homogeneous reactions, we were able to determine the process conditions that will promote the heterogeneous surface reaction on the surface of the substrate. COMSOL numerical simulations and MATLAB were used to estimate the final CuS film thickness and the process kinetics based on experimental results under multiple operating conditions. Successful kinetic modeling and parameter estimations were performed by adjusting the parameters of mass transport equations that controlled the proposed reaction mechanism of CuS. Therefore, this model can be used as a tool for kinetic parameter estimation and optimization of metal chalcogenide thin films in a PCD system.

Graphical abstract: Growth kinetics of copper sulfide thin films by photochemical deposition

Article information

Article type
Paper
Submitted
26 Apr 2016
Accepted
19 Jul 2016
First published
19 Jul 2016

CrystEngComm, 2016,18, 6748-6758

Growth kinetics of copper sulfide thin films by photochemical deposition

P. Vas-Umnuay, K. Kim and C. Chang, CrystEngComm, 2016, 18, 6748 DOI: 10.1039/C6CE00967K

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