Issue 35, 2016

Carbon- and crack-free growth of hexagonal boron nitride nanosheets and their uncommon stacking order

Abstract

The quality of hexagonal boron nitride nanosheets (h-BNNS) is often associated with the most visible aspects such as lateral size and thickness. Less obvious factors such as sheet stacking order could also have a dramatic impact on the properties of BNNS and therefore its applications. The stacking order can be affected by contamination, cracks, and growth temperatures. In view of the significance of chemical-vapour-decomposition (CVD) assisted growth of BNNS, this paper reports on strategies to grow carbon- and crack-free BNNS by CVD and describes the stacking order of the resultant BNNS. Pretreatment of the most commonly used precursor, ammonia borane, is necessary to remove carbon contamination caused by residual hydrocarbons. Flattening the Cu and W substrates prior to growth and slow cooling around the Cu melting point effectively facilitate the uniform growth of h-BNNS, as a result of a minimal temperature gradient across the Cu substrate. Confining the growth inside alumina boats effectively minimizes etching of the nanosheet by silica nanoparticles originating from the commonly used quartz reactor tube. h-BNNS grown on solid Cu surfaces using this method adopt AB, ABA, AC′, and AC′B stacking orders, which are known to have higher energies than the most stable AA′ configuration. These findings identify a pathway for the fabrication of high-quality h-BNNS via CVD and should spur studies on stacking order-dependent properties of h-BNNS.

Graphical abstract: Carbon- and crack-free growth of hexagonal boron nitride nanosheets and their uncommon stacking order

Supplementary files

Article information

Article type
Paper
Submitted
12 Jun 2016
Accepted
06 Jul 2016
First published
11 Jul 2016

Nanoscale, 2016,8, 15926-15933

Carbon- and crack-free growth of hexagonal boron nitride nanosheets and their uncommon stacking order

M. H. Khan, G. Casillas, D. R. G. Mitchell, H. K. Liu, L. Jiang and Z. Huang, Nanoscale, 2016, 8, 15926 DOI: 10.1039/C6NR04734C

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements