Issue 41, 2016

Low-k and superior comprehensive property hybrid materials of a fluorinated polyimide and pure silica zeolite

Abstract

In this study, various amounts of an amino-derivative of pure silica zeolite nanocrystals (A-PSZN) were blended with fluorinated poly(amic acid) (FPAA) to form a FPAA/A-PSZN precursor solution, and the fluorinated polyimide (FPI)/A-PSZN hybrid films were prepared via spin-coating and following thermal imidization of the FPAA/A-PSZN solution. A series of FPI/A-PSZN hybrid films were investigated scientifically based on the dielectric constant (k), water absorption, dynamic mechanical and thermal and mechanical properties. It is found that the k value decreases from 3.11 for pristine FPI to 2.65 for the FPI/7 wt% A-PSZN hybrid, which is attributed to the air within the micropore of A-PSZN and the inhibited molecular polarization originating from the internal cross-linking structure of hybrids. Due to the effective phase interconnection and the inherent excellent property of A-PSZN, on the other hand, the incorporation of A-PSZN results in the improvement of the storage modulus, glass transition temperature, thermal stability, Young's modulus, tensile strength and the decrease of water absorption, and thermal expansion coefficients for materials. The results indicate that the incorporation of A-PSZN is a promising approach to reduce the k value and improve the comprehensive properties of FPI, and the FPI/A-PSZN hybrid materials are potentially useful in the microelectronic industry.

Graphical abstract: Low-k and superior comprehensive property hybrid materials of a fluorinated polyimide and pure silica zeolite

Article information

Article type
Paper
Submitted
25 Jan 2016
Accepted
31 Mar 2016
First published
04 Apr 2016

RSC Adv., 2016,6, 34825-34832

Low-k and superior comprehensive property hybrid materials of a fluorinated polyimide and pure silica zeolite

Z. Huang and J. Zhao, RSC Adv., 2016, 6, 34825 DOI: 10.1039/C6RA02183B

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements