Issue 45, 2016, Issue in Progress
From the journal:

RSC Advances

Eco-friendly photolithography using water-developable pure silk fibroin†

Joonhan Park,a   Sung-Gyu Lee,b   Benedetto Marelli,c   Myungjae Lee,d   Taehyung Kim,a   Hye-Keun Oh,b   Heonsu Jeon,d   Fiorenzo G. Omenettocef  and  Sunghwan Kim*ag  

* Corresponding authors

a Department of Energy Systems Research, Ajou University, Suwon 16499, Republic of Korea
E-mail: sunghwankim@ajou.ac.kr

b Department of Applied Physics, Hanyang University, Ansan 15588, Republic of Korea

c Department of Biomedical Engineering, Tufts University, Medford, MA 02155, USA

d Department of Physics and Astronomy, Seoul National University, Seoul 08826, Republic of Korea

e Department of Physics, Tufts University, Medford, MA 02155, USA

f Department of Electrical and Computer Engineering, Tufts University, Medford, MA 02155, USA

g Department of Physics, Ajou University, Suwon 16499, Republic of Korea

Abstract

We report that pure silk fibroin can be a green and biofunctional photoresist for deep ultraviolet photolithography. All processes are entirely water-based, from resist solvent to resist removal, and rely on the phototendering effect that decreases the crystallinity of silk fibroin films by DUV exposure. Additionally, the potential decrease in activity of bio-dopants due to high-energy irradiation is irrelevant to our positive-tone lithographic method.

Graphical abstract: Eco-friendly photolithography using water-developable pure silk fibroin

About
Cited by
Related
Download options Please wait...

Supplementary files

Article information

DOI
https://doi.org/10.1039/C6RA04516B
Article type
Communication
Submitted
19 Feb 2016
Accepted
28 Mar 2016
First published
14 Apr 2016

RSC Adv., 2016,6, 39330-39334

Permissions

Request permissions

Eco-friendly photolithography using water-developable pure silk fibroin

J. Park, S. Lee, B. Marelli, M. Lee, T. Kim, H. Oh, H. Jeon, F. G. Omenetto and S. Kim, RSC Adv., 2016, 6, 39330 DOI: 10.1039/C6RA04516B

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements