Issue 60, 2017

Negative differential resistance and hysteresis in Au/MoO3−δ/Au devices

Abstract

Metal/oxide/metal thin devices may exhibit hysteresis and negative differential resistance (NDR) under time-varying voltage at low temperatures that strongly depend on the frequency of the applied voltage. Herein, we demonstrated and analyzed this in Au/MoO3−δ/Au devices, tested at 55–80 °C. Reduced MoO3−δ is a mixed ionic–electronic conductor (MIEC) that conducts electrons and oxygen vacancies. Hysteresis and NDR disappear at high scan rates of the applied voltage when the ion motion is practically frozen and at low scan rates when the response to voltage cycles is quasi-static. Contrary to cyclic voltammetry in electrochemistry, peaks that appear and end with NDR are not because of a redox reaction but a result of the dynamics of the ionic motion. A low rate of exchange of oxygen with the ambient is detected during prolonged measurements. The anodic reaction is found to be faster than the cathodic reaction, and the oxide is reduced under (anti) symmetric voltage cycles. Upon fitting a theory previously reported by our group, the electron mobility and activation energy, oxygen vacancy mobility and activation energy, as well as oxygen exchange current density of the electrodes, of the device were obtained at relatively low temperatures.

Graphical abstract: Negative differential resistance and hysteresis in Au/MoO3−δ/Au devices

Supplementary files

Article information

Article type
Paper
Submitted
06 Jun 2017
Accepted
21 Jul 2017
First published
02 Aug 2017
This article is Open Access
Creative Commons BY license

RSC Adv., 2017,7, 38059-38068

Negative differential resistance and hysteresis in Au/MoO3−δ/Au devices

D. Kalaev, A. Rothschild and I. Riess, RSC Adv., 2017, 7, 38059 DOI: 10.1039/C7RA06334B

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

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