Issue 89, 2017

Manipulating resistive states in oxide based resistive memories through defective layers design

Abstract

In this work, multilevel switching was achieved by a strategically designed alternative multi-layer structure with pure and Mn-doped SnO2. In this multilayer structure, by utilizing the pure SnO2 layer as an ionic defect diffusion barrier, the migration of ionic defects from the doped layers can be controlled and the intermediate resistance states were stabilized. The multilevel devices exhibit superior performances with a high ON/OFF ratio, low operation voltage and excellent retention. Such an alternative multi-layer structure could be a potential strategy for achieving high-density memories.

Graphical abstract: Manipulating resistive states in oxide based resistive memories through defective layers design

Supplementary files

Article information

Article type
Paper
Submitted
23 Oct 2017
Accepted
08 Dec 2017
First published
15 Dec 2017
This article is Open Access
Creative Commons BY license

RSC Adv., 2017,7, 56390-56394

Manipulating resistive states in oxide based resistive memories through defective layers design

Z. Xu, P. Guan, A. Younis, D. Chu and S. Li, RSC Adv., 2017, 7, 56390 DOI: 10.1039/C7RA11681K

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

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