Formation mechanism of rectangular-ambulatory-plane TiO2 plates: an insight into the role of hydrofluoric acid

Yajun Zou; Ge Gao; Zhenyu Wang; Jian-Wen Shi; Hongkang Wang; Dandan Ma; Zhaoyang Fan; Xin Chen; Zeyan Wang; Chunming Niu

doi:10.1039/C8CC02309C

Formation mechanism of rectangular-ambulatory-plane TiO₂ plates: an insight into the role of hydrofluoric acid†

Yajun Zou,‡^a Ge Gao,‡^a Zhenyu Wang,‡^ab Jian-Wen Shi,

*^ac Hongkang Wang,

^a Dandan Ma,^a Zhaoyang Fan,^a Xin Chen,^a Zeyan Wang

^c and Chunming Niu^a

Author affiliations

* Corresponding authors

^a Center of Nanomaterials for Renewable Energy, State Key Laboratory of Electrical nsulation and Power Equipment, School of Electrical Engineering, Xi'an Jiaotong University, Xi'an 710049, China
E-mail: jianwen.shi@mail.xjtu.edu.cn

^b University College London, Kathleen Lonsdale Materials Chemistry, Department of Chemistry, 20 Gordon Street, London WC1H 0AJ, UK

^c State Key Laboratory of Crystal Materials, Shandong University, Jinan, China

Abstract

A novel rectangular-ambulatory-plane TiO₂ plate with exposed {001} facets was developed for the first time via a facile microwave-assisted hydrothermal approach in the presence of HF solution. Solid evidence demonstrated that HF plays dual roles in the hydrothermal process, both as a stabilizer for the {001} facet growth and as an etching reagent selectively destroying the {001} facets.

Chemical Communications

Formation mechanism of rectangular-ambulatory-plane TiO₂ plates: an insight into the role of hydrofluoric acid†

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Formation mechanism of rectangular-ambulatory-plane TiO₂ plates: an insight into the role of hydrofluoric acid

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