Issue 6, 2018

Strong spin–orbit interaction and magnetotransport in semiconductor Bi2O2Se nanoplates

Abstract

Semiconductor Bi2O2Se nanolayers of high crystal quality have been realized via epitaxial growth. These two-dimensional (2D) materials possess excellent electron transport properties with potential application in nanoelectronics. It is also strongly expected that the 2D Bi2O2Se nanolayers can be an excellent material platform for developing spintronic and topological quantum devices if the presence of strong spin–orbit interaction in the 2D materials can be experimentally demonstrated. Herein, we report the experimental determination of the strength of spin–orbit interactions in Bi2O2Se nanoplates through magnetotransport measurements. The nanoplates are epitaxially grown by chemical vapor deposition, and the magnetotransport measurements are performed at low temperatures. The measured magnetoconductance exhibits a crossover behavior from weak antilocalization to weak localization at low magnetic fields with increasing temperature or decreasing back gate voltage. We have analyzed this transition behavior of magnetoconductance based on an interference theory, which describes quantum correction to the magnetoconductance of a 2D system in the presence of spin–orbit interaction. Dephasing length and spin relaxation length are extracted from the magnetoconductance measurements. Compared to the case of other semiconductor nanostructures, the extracted relatively short spin relaxation length of ∼150 nm indicates the existence of a strong spin–orbit interaction in Bi2O2Se nanolayers.

Graphical abstract: Strong spin–orbit interaction and magnetotransport in semiconductor Bi2O2Se nanoplates

Supplementary files

Article information

Article type
Communication
Submitted
28 Nov 2017
Accepted
03 Jan 2018
First published
04 Jan 2018

Nanoscale, 2018,10, 2704-2710

Strong spin–orbit interaction and magnetotransport in semiconductor Bi2O2Se nanoplates

M. Meng, S. Huang, C. Tan, J. Wu, Y. Jing, H. Peng and H. Q. Xu, Nanoscale, 2018, 10, 2704 DOI: 10.1039/C7NR08874D

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