Highly selective CO2 removal for one-step liquefied natural gas processing by physisorbents

David G. Madden; Daniel O’Nolan; Kai-Jie Chen; Carol Hua; Amrit Kumar; Tony Pham; Katherine A. Forrest; Brian Space; John J. Perry; Majeda Khraisheh; Michael J. Zaworotko

doi:10.1039/C9CC00626E

Highly selective CO₂ removal for one-step liquefied natural gas processing by physisorbents†

David G. Madden,

^a Daniel O’Nolan,

^a Kai-Jie Chen,

^a Carol Hua,

^a Amrit Kumar,

^a Tony Pham,

^b Katherine A. Forrest,^b Brian Space,

^b John J. Perry,

^a Majeda Khraisheh^c and Michael J. Zaworotko

*^a

Author affiliations

* Corresponding authors

^a Bernal Institute, Department of Chemical Sciences, University of Limerick, Limerick, Republic of Ireland
E-mail: Xtal@ul.ie

^b Department of Chemistry, University of South Florida, 4202 East Fowler Avenue, CHE205, Tampa, Florida 33620, USA

^c Department of Chemical Engineering, College of Engineering, Qatar University, Doha, Qatar

Abstract

Industrial specifications require CO₂ concentrations in natural gas below 50 ppm during liquefaction because of corrosion and CO₂ freezing. Herein, we report a physisorbent (TIFSIX-3-Ni) that exhibits new benchmark CO₂/CH₄ selectivity and fast kinetics, thereby enabling one-step LNG processing to CO₂ levels of 25 ppm.

Chemical Communications

Highly selective CO₂ removal for one-step liquefied natural gas processing by physisorbents†

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