Issue 10, 2019

AC parallel local oxidation of silicon

Abstract

Here, we present a suitable advancement of parallel local oxidation nanolithography, demonstrating its feasibility in alternate current mode (AC-PLON). For demonstration, we fabricated model structures consisting of an array of parallel nanostripes of electrochemical SiOx with a controlled roughness. Besides, we proved the repeatability of AC-PLON and its integrability with conventional parallel local oxidation nanolithography.

Graphical abstract: AC parallel local oxidation of silicon

Article information

Article type
Communication
Submitted
17 Jul 2019
Accepted
02 Sep 2019
First published
03 Sep 2019
This article is Open Access
Creative Commons BY-NC license

Nanoscale Adv., 2019,1, 3887-3891

AC parallel local oxidation of silicon

Z. Hemmatian, D. Gentili, M. Barbalinardo, V. Morandi, L. Ortolani, G. Ruani and M. Cavallini, Nanoscale Adv., 2019, 1, 3887 DOI: 10.1039/C9NA00445A

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