Issue 64, 2019

In-plane rotation and transition from rectification to bipolar resistive switching in ZnO/SrTiO3:Nb heterojunctions by substrate pretreatment

Abstract

The growth behavior and electrical transport properties of ZnO films was found to be strongly dependent on the deionized water soaking treatment of 0.7 wt% (111) SrTiO3:Nb substrates. Comparing the ZnO films on soaked SrTiO3:Nb substrates with those on unsoaked ones, the out-of-plane orientation of ZnO films are both along the c-axis, while there is an in-plane rotation of ZnO thin films. According to the variable frequency capacitance–voltage measurements, a much higher interface state density is found in the ZnO/soaked-SrTiO3:Nb heterojunction than that in the ZnO/unsoaked-SrTiO3:Nb heterojunction. Moreover, a rectification and bipolar resistive switching effect were observed in the ZnO/unsoaked-SrTiO3:Nb and ZnO/soaked-SrTiO3:Nb heterojunctions, respectively. The transition from rectification to a bipolar resistive switching effect can be ascribed to an increase of oxygen vacancies, the migration of which plays an important part in the resistive switching.

Graphical abstract: In-plane rotation and transition from rectification to bipolar resistive switching in ZnO/SrTiO3:Nb heterojunctions by substrate pretreatment

Article information

Article type
Paper
Submitted
10 Sep 2019
Accepted
13 Nov 2019
First published
19 Nov 2019
This article is Open Access
Creative Commons BY-NC license

RSC Adv., 2019,9, 37668-37674

In-plane rotation and transition from rectification to bipolar resistive switching in ZnO/SrTiO3:Nb heterojunctions by substrate pretreatment

Y. Zhang, J. Li, Y. Yin, W. Zhang and C. Jia, RSC Adv., 2019, 9, 37668 DOI: 10.1039/C9RA07252G

This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence. You can use material from this article in other publications, without requesting further permission from the RSC, provided that the correct acknowledgement is given and it is not used for commercial purposes.

To request permission to reproduce material from this article in a commercial publication, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party commercial publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements