Issue 65, 2019

Micro-to-nanometer patterning of solution-based materials for electronics and optoelectronics

Abstract

Technologies for micro-to-nanometer patterns of solution-based materials (SBMs) contribute to a wide range of practical applications in the fields of electronics and optoelectronics. Here, state-of-the-art micro-to-nanometer scale patterning technologies of SBMs are disseminated. The utilisation of patterning for a wide-range of SBMs leads to a high level of control over conventional solution-based film fabrication processes that are not easily accessible for the control and fabrication of ordered micro-to-nanometer patterns. In this review, various patterning procedures of SBMs, including modified photolithography, direct-contact patterning, and inkjet printing, are briefly introduced with several strategies for reducing their pattern size to enhance the electronic and optoelectronic properties of SBMs explained. We then conclude with comments on future research directions in the field.

Graphical abstract: Micro-to-nanometer patterning of solution-based materials for electronics and optoelectronics

Article information

Article type
Review Article
Submitted
17 Sep 2019
Accepted
12 Nov 2019
First published
22 Nov 2019
This article is Open Access
Creative Commons BY license

RSC Adv., 2019,9, 38085-38104

Micro-to-nanometer patterning of solution-based materials for electronics and optoelectronics

Y. Suh, D. Shin and Y. T. Chun, RSC Adv., 2019, 9, 38085 DOI: 10.1039/C9RA07514C

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

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