Issue 5, 2019

An electronic synapse memristor device with conductance linearity using quantized conduction for neuroinspired computing

Abstract

An electrochemical metallization memristor based on Zr0.5Hf0.5O2 film and an active Cu electrode with quantum conductance and neuromorphic behavior has been reported in this work. After electroforming in the Cu/Zr0.5Hf0.5O2/Pt device, linear conductance characteristics in low resistance states were found and the stepwise changes of conductance with the order of G0 ((=2e2)/h) multilevel states were obtained by varying pulse amplitude, width and adjacent-pulse time interval, which is beneficial for backpropagation learning algorithms belonging to deep neural networks, essentially using memristors as vector–matrix multiplication accelerators in image processing. The gradual resistance tuning served as the basis of memory and learning. Under the coactivity of pre- and post-synaptic spikes, bidirectional long-term Hebbian plasticity modulation was realized. The temporal difference, spike rate and size of the top and bottom electrode pulse voltage can strongly affect the sign and degree of Hebbian plasticity. Moreover, the quantum conductance phenomenon was ascribed to interstitial Cu in the dielectric layer forming single- and multi-atom chains. The results can provide multilevel storage and next-generation parallel neuromorphic computing architecture, promoting the development of functional plastic electronic synapses.

Graphical abstract: An electronic synapse memristor device with conductance linearity using quantized conduction for neuroinspired computing

Supplementary files

Article information

Article type
Paper
Submitted
02 Sep 2018
Accepted
26 Nov 2018
First published
01 Dec 2018

J. Mater. Chem. C, 2019,7, 1298-1306

An electronic synapse memristor device with conductance linearity using quantized conduction for neuroinspired computing

J. Zhao, Z. Zhou, Y. Zhang, J. Wang, L. Zhang, X. Li, M. Zhao, H. Wang, Y. Pei, Q. Zhao, Z. Xiao, K. Wang, C. Qin, G. Wang, H. Li, B. Ding, F. Yan, K. Wang, D. Ren, B. Liu and X. Yan, J. Mater. Chem. C, 2019, 7, 1298 DOI: 10.1039/C8TC04395G

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements