Issue 9, 2019

Fast self-assembly of polystyrene-b-poly(fluoro methacrylate) into sub-5 nm microdomains for nanopatterning applications

Abstract

The block copolymer (BCP) approach is a promising route for sub-10 nm semiconductor lithography. In this paper, a series of polystyrene-block-poly(pentadecafluorooctyl methacrylate) (PS-b-PPDFMA) copolymers are designed and synthesized by living anionic polymerization. The BCP phase behavior is investigated using small-angle X-ray scattering and transmission electron microscopy. The resulting BCP materials form sub-5 nm features after 1 min of thermal annealing at 80 °C. The Flory–Huggins interaction parameter of PS-b-PPDFMA is very large (0.353 at 150 °C) because of the significant incompatibility between polystyrene and the perfluoroalkyl block. These results qualify PS-b-PPDFMA as a potential material for sub-5 nm patterning applications.

Graphical abstract: Fast self-assembly of polystyrene-b-poly(fluoro methacrylate) into sub-5 nm microdomains for nanopatterning applications

Supplementary files

Article information

Article type
Communication
Submitted
22 Dec 2018
Accepted
07 Feb 2019
First published
08 Feb 2019

J. Mater. Chem. C, 2019,7, 2535-2540

Fast self-assembly of polystyrene-b-poly(fluoro methacrylate) into sub-5 nm microdomains for nanopatterning applications

X. Li, J. Li, C. Wang, Y. Liu and H. Deng, J. Mater. Chem. C, 2019, 7, 2535 DOI: 10.1039/C8TC06480F

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements