COvalent monolayer patterns in Microfluidics by PLasma etching Open Technology – COMPLOT

Stan B. J. Willems; Jaccoline Zegers; Anton Bunschoten; R. Martijn Wagterveld; Fijs W. B. van Leeuwen; Aldrik H. Velders; Vittorio Saggiomo

doi:10.1039/C9AN02407G

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COvalent monolayer patterns in Microfluidics by PLasma etching Open Technology – COMPLOT†

Stan B. J. Willems,

^abc Jaccoline Zegers,^a Anton Bunschoten,

^ac R. Martijn Wagterveld,^b Fijs W. B. van Leeuwen,

^ac Aldrik H. Velders

^ac and Vittorio Saggiomo

*^a

Author affiliations

* Corresponding authors

^a Laboratory of BioNanoTechnology, Wageningen University and Research, Bornse Weilanden 9, 6708 WG Wageningen, the Netherlands
E-mail: vittorio.saggiomo@wur.nl

^b Wetsus, European Centre of Excellence for Sustainable Water Technology, Oostergoweg 9, 8911 MA Leeuwarden, the Netherlands

^c Interventional Molecular Imaging, Department of Radiology, Leiden University and Medical Centre, 2300 RC Leiden, the Netherlands

Abstract

Plasma microcontact patterning (PμCP) and replica molding were combined to make PDMS/glass microfluidic devices with β-cyclodextrin (β-CD) patterns attached covalently on the glass surface inside microchannels. The supramolecular reactivity, reusability and association constant of β-CD with Cy5–Ad₂ was tested by analyzing signal-to-noise ratios of patterns vs. spacing with fluorescence microscopy.

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DOI: https://doi.org/10.1039/C9AN02407G
Article type: Communication
Submitted: 29 Nov 2019
Accepted: 12 Jan 2020
First published: 13 Jan 2020
This article is Open Access

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Analyst, 2020,145, 1629-1635

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COvalent monolayer patterns in Microfluidics by PLasma etching Open Technology – COMPLOT

S. B. J. Willems, J. Zegers, A. Bunschoten, R. M. Wagterveld, F. W. B. van Leeuwen, A. H. Velders and V. Saggiomo, Analyst, 2020, 145, 1629 DOI: 10.1039/C9AN02407G

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COvalent monolayer patterns in Microfluidics by PLasma etching Open Technology – COMPLOT†

Abstract

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COvalent monolayer patterns in Microfluidics by PLasma etching Open Technology – COMPLOT

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