Issue 8, 2020
From the journal:

Chemical Communications

N-Heterocyclic carbene and thiol micropatterns enable the selective deposition and transfer of copper films†

Zhe She, ORCID logo ‡*ab   Mina R. Narouz,‡b   Christene A. Smith,b   Amy MacLean, ORCID logo b   Hans-Peter Loock,b   Heinz-Bernhard Kraatz ORCID logo *ac  and  Cathleen M. Crudden ORCID logo *bd  

* Corresponding authors

a Department of Physical and Environmental Sciences, University of Toronto Scarborough, 1265 Military Trail, Toronto, Ontario, Canada
E-mail: bernie.kraatz@utoronto.ca

b Department of Chemistry, Queen's University, 90 Bader Lane, Kingston, Ontario, Canada
E-mail: zhe.she@queensu.ca, cruddenc@chem.queensu.ca

c Department of Chemistry, University of Toronto, 80 St. George Street, Toronto, Ontario, Canada

d Institute of Transformative Bio-Molecules (WPI-ITbM), Nagoya University, Chikusa, Nagoya 464-8602, Japan

Abstract

Microcontact printed patterns of N-heterocyclic carbenes (NHCs) and thiols were prepared on gold substrates and utilized as templates for the creation of metallic Cu structures using electroplating. The presence of the NHC in the pattern is essential to enable the transfer of the resulting copper microstructures to a second substrate.

Graphical abstract: N-Heterocyclic carbene and thiol micropatterns enable the selective deposition and transfer of copper films

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Article information

DOI
https://doi.org/10.1039/C9CC08919E
Article type
Communication
Submitted
14 Nov 2019
Accepted
23 Dec 2019
First published
24 Dec 2019

Chem. Commun., 2020,56, 1275-1278

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N-Heterocyclic carbene and thiol micropatterns enable the selective deposition and transfer of copper films

Z. She, M. R. Narouz, C. A. Smith, A. MacLean, H. Loock, H. Kraatz and C. M. Crudden, Chem. Commun., 2020, 56, 1275 DOI: 10.1039/C9CC08919E

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