Issue 4, 2020

A facile and robust approach to prepare fluorinated polymer dielectrics for probing the intrinsic transport behavior of organic semiconductors

Abstract

Insulating polymers are often used as gate dielectric materials in all-solution processable organic thin-film transistors (OTFTs). Nonetheless, most of the polymers have poor resistance to common halogenated solvents and thus are not feasible for bottom-gate OTFT structures. In this contribution, we show that high molecular weight poly(2,3,4,5,6-pentafluorostyrene) (PPFS) is a gate dielectric material that can be free from this limitation. We prepare PPFS with a facile and efficient approach by using methyl isobutyl ketone (MIK) solvent in a basic wet-lab without the need of complex chemical equipment. Furthermore, the non-polar and hydrophobic nature of the PPFS surface allows us to probe the intrinsic transport behaviors of these acceptors. The MIK solvent-assisted polymerization method provides an alternative for low-cost effective gate polymer dielectric preparation. Such a novel but simple synthesis paradigm not only opens up a broad employment of solution-processable polymeric dielectrics for bottom-gate OTFTs, but also enables the full device potential with high-mobility semiconductors.

Graphical abstract: A facile and robust approach to prepare fluorinated polymer dielectrics for probing the intrinsic transport behavior of organic semiconductors

Supplementary files

Article information

Article type
Paper
Submitted
07 Apr 2020
Accepted
18 Jun 2020
First published
18 Jun 2020
This article is Open Access
Creative Commons BY-NC license

Mater. Adv., 2020,1, 891-898

A facile and robust approach to prepare fluorinated polymer dielectrics for probing the intrinsic transport behavior of organic semiconductors

J. H. L. Ngai, C. C. M. Chan, C. H. Y. Ho, J. K. W. Ho, S. H. Cheung, H. Yin and S. K. So, Mater. Adv., 2020, 1, 891 DOI: 10.1039/D0MA00175A

This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence. You can use material from this article in other publications, without requesting further permission from the RSC, provided that the correct acknowledgement is given and it is not used for commercial purposes.

To request permission to reproduce material from this article in a commercial publication, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party commercial publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements